Diffusion and interface growth in hafnium oxide and silicate ultrathin films on Si(001)
نویسندگان
چکیده
L.V. Goncharova,1,* M. Dalponte,1 T. Feng,1 T. Gustafsson,1 E. Garfunkel,2 P.S. Lysaght,3 and G. Bersuker3 1Departments of Physics and Astronomy, Rutgers University, 136 Frelinghuysen Road, Piscataway, New Jersey 08854, USA 2Department of Chemistry and Chemical Biology, Rutgers University, 136 Frelinghuysen Road, Piscataway, New Jersey 08854, USA 3Sematech, Austin, Texas 78741, USA (Received 30 November 2010; revised manuscript received 24 January 2011; published 25 March 2011)
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